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| 科研成果 |
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| 论文题目： |
A novel SU-8 nanofluidic chip fabrication technique based on traditional UV photolithography |
| 第一作者： |
Yin ZF(殷志富);Lu BL(鲁伯林);Zou, Helin |
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| 发表刊物： |
Microsystem Technologies |
| 发表年度： |
2017 |
| 卷,期,页： |
23,12,5613-5619 |
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| 论文摘要： |
Nanofluidic chips are becoming increasingly important for biological and chemical applications due to the special phenomena only occur in nanochannels. In this study, a simple and low-cost method for fabricating SU-8 nanofluidic chips is proposed based on traditional ultraviolet (UV) photolithography. The thermal-induced cracks (nanochannels) can be automatically formed by thermal stress release during the postbake process. The influence of pattern-shape, pattern-angle and pattern-distance on the maximum stress of the SU-8 patterns was investigated. And the effect of postbake temperature on the maximum stress of the SU-8 patterns was also analyzed. The numerical and experimental results show that when the triangle SU-8 patterns with pattern-angle of 60° is postbaked at 125 °C, the nanocracks can be easily formed between two patterns. With this newly developed technology, simple, low-cost and large scale nanofluidic chips can be fabricated only by traditional UV photolighography, which allows a commercially manufacturing of nano-components. |
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